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News & Insights | KDF Technologies
KDF Technologies

News & Insights

The latest innovations, product launches, and technical breakthroughs from KDF Technologies — the leader in inline batch sputtering systems.

Featured Stories
White Paper
Engineering TiO₂ Thin-Film Properties Through Oxygen Control

How KDF's reactive DC sputtering platform enables precise tuning of TiO₂ optical, mechanical, and electrical properties — refractive index from 2.1 to 2.8, roughness from 250 Å to 50 Å, all at constant thickness.

April 2026
Read White Paper →
Technical Paper
ERPP Technology: Achieving ±1% Thin Film Uniformity

A breakthrough in sputtering system design delivering metallic film uniformity better than ±1% and repeatability exceeding ±0.5% — combining advanced planetary motion with linear scanning.

July 2025
Read Article →
Heritage
MRC Heritage & Evolution: Honoring a Legacy of Innovation

How KDF Technologies acquired and preserved MRC's legendary 903/943 sputtering platforms — and continues advancing them for today's semiconductor and photonics industries.

August 2025
Read Article →
Latest News
Recent Articles & Updates
White Paper
Reactive Sputtering
Engineering TiO₂ Thin-Film Properties Through Oxygen Control

Precise tuning of TiO₂ optical, mechanical, and electrical properties via O₂/(Ar+O₂) ratio — refractive index, roughness, stress, and sheet resistance all controllable at constant thickness.

April 2026
KDF Technologies
Company News
Built for Production. Trusted for Repeatability. Backed by Kurt J. Lesker Company.

Repeatable results, rugged equipment, and tools that scale with your line — KDF Technologies, part of the Kurt J. Lesker Company family.

2025
KDF Technologies
Technical
Precision without Poisoning: Plasma Emission Monitoring in Reactive Sputtering

Advanced process control for functional oxides, nitrides and compounds via plasma emission monitoring technology.

2025
KDF Technologies
Innovation
Advancements in Reactive Sputtering with KDF's Sputter Sources and PEM

KDF continues to innovate in reactive sputtering with specially designed and patented sputter sources integrated with Plasma Emission Monitoring.

2025
KDF Technologies
Technical
Enhancing Reactive Sputtering with KDF's Unique Features

Optimally designed gas rings, specialized cathode configurations, and other features that set KDF apart in reactive sputtering applications.

2024
KDF Technologies
Customer News
KDF Technologies Hosts Boston Scientific

KDF recently hosted Boston Scientific for acceptance testing of their new 954i sputter system, joining their existing fleet of KDF tools.

2024
KDF Technologies
Product Update
KDF 5 Pallet Stacker Option for the 900i Series Batch Sputtering Systems

New option allows 5 pallets to be loaded into the system load lock simultaneously, increasing throughput and reducing operator intervention.

2023
KDF Technologies
Product Update
KDF Enhanced Planetary Pallet for 900i Series Batch Sputtering Systems

The new internally motor-driven planetary pallet accommodates wafer sizes from 2 to 5 inches with improved uniformity performance.

2023
KDF Technologies
Product Update
KDF 844i Batch Sputtering System Enhancements

The 844i has been re-engineered to process heavier payloads up to 140 lbs with new upgrades across the platform.

2022
KDF Technologies
Innovation
LMM™ — Linear Moving Magnet Cathode

A patented full face erosion rectangular cathode design available for all KDF systems, delivering superior target utilization.

2021
KDF Technologies
Applications
Solutions in Action

How KDF's precision sputtering systems are enabling the next generation of reliable consumer and industrial electronic devices.

2020
Press Releases
Archive
2012 KDF Tools Selected for High Efficiency PV Solar Cell Manufacture in USA and China → 2010 KDF Tools Selected for Pacemaker Component Manufacture in USA and Mexico → 2019 KDF Announces the Release of its New Improved Pallet Assist Tool (PAT) → 2009 KDF Announces the Release of the G-12 Full-Face Erosion Cathode → 2008 KDF Releases Newest Version of the Field Proven LMM™ Cathodes → 2008 KDF Releases and Installs the New 844i Systems → 2007 KDF Announces the New i Series System Controls Platform → 2006 KDF Broadens Customer Relationships with Leading Medical Equipment OEMs → 2006 Equipping a $165M Digital X-Ray Production Facility → 2006 KDF's First Sale of Cluster Intelligence Tool Extends Ovonyx's Non-Volatile Memory Capabilities → 2005 KDF Expands Presence in China with Sale to Beijing Microelectronics Institute → 2005 Fupo Electronics Purchases KDF 844NT for High-Volume Wafer Bumping Manufacturing → 2005 KDF 744NT Batch Sputtering System Installed for Research at Arizona State University → 2005 Leading Health Equipment OEM Purchases Two KDF 744NT Systems for Digital X-Ray Production → 2004 TFR Technologies Selects KDF 954NTX with ERPP Option for Uniform, Repeatable Thin Film Deposition → Legacy Obsolete Operating Systems — Upgrade Path Information → Legacy End of Life — MRC Batch Product Line Support Information → 2013 Pirates Abound: The Problem with IP for OEMs — Vacuum & Coating Technology Magazine →
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We offer the most advanced and reliable physical vapor deposition batch in-line sputtering tools at the industry’s lowest cost of ownership. KDF systems can be customized to meet the customer’s needs and cover a wide variety of process requirements for the mainstream silicon, emerging materials and flat panel display markets.

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