600i Series
Dual load lock, in-line RF/DC side sputtering batch systems built for sensitive applications requiring the lowest defect rates. Full KDF process heritage in a compact, cost-effective platform.
Built for Sensitive Applications
The 600i Series is KDF's entry production platform — purpose-built for applications using target materials that produce unusually high particulate contamination. These systems surpass the criteria for thin film deposition in high-density devices and applications requiring absolutely minimal defects.
600i Series — Chamber Interior
The 600i Series supports multi-process sputtering for maximum process flexibility. The 600ix family features KDF's patented Linear Moving Magnetron™ (LMM™) cathode — engineered for high-rate reactive processes, full-face target erosion, and low particle generation.
All 600i systems handle one 8" wafer or up to thirty-six 2" wafers, with optional gas delivery systems for enhanced reactive processes. Remote PC accessibility via Ethernet is standard for software upgrades and diagnostics.
Standard System Capabilities
- Vertical side sputtering — small footprint
- 12" × 12" pallet with unique pallet designs available
- Dual-process loadlock for production exchange cycles
- Optional high vacuum loadlock with quartz heater lamps
- Multiple bias types enabling denser films and planarization
- Multi-size capability — substrate size changeable run to run
- Scan velocity profiling for enhanced uniformity
- Optional robot for particulate-free cassette-to-cassette handling
- Optional integrated RGA for process and fault monitoring
- In-situ pallet optical temperature measurement and control
- LMM™ cathode available (ix series) — full-face erosion, low particles
- Pulsed DC via Advanced Energy Pinnacle Plus available
- SECS/GEM connectivity via OPC server interface
- Complies with NFPA 79 and Semiconductor S2-0706 safety specs
600i Series Model Lineup
The 600i family spans from the base 603i to the four-target 654ix — each model building on the last with additional vacuum, process, and cathode capabilities.
The entry-level 600i configuration. Rough-pumped load lock for fast production exchange cycles. Optimized for sensitive applications with high-particulate target materials. Widely used in telecommunications manufacturing, chip resistor, and resistor network applications.
Builds on the 603i with a high-vacuum pumped load lock with quartz heat lamps for tighter process control. Features palletized batch processing with instantaneous wafer size changes run to run. KDF maintains an extensive pallet library for a wide range of substrate applications including GaAs front/back-side processes.
Developed for the telecommunications and compound semiconductor markets. Four-target versatility supports the full range of leading-edge microelectronic component manufacturing. Enhanced etch and deposition uniformity with high-speed batch processing capability.
KDF's X-Series™ with 17" extended cathodes for improved uniformity across the entire pallet. Available in Planar™, Inset™, and RF/DC LMM™ configurations. The LMM™ cathode delivers bulletproof high-rate reactive processes with full-face target erosion and industry-leading low particle generation.
Vacuum & Facility Requirements
Hardware, Controls & Software
System Hardware
- 12 kW low stored energy DC power supplies (Advanced Energy) — optional Pinnacle Plus pulsed DC
- Integrated throttling SS VAT valve for upstream or downstream pressure control
- MKS multi-component "Smart" 390 and 925 gauges for integrated vacuum measurement
- Process gas control: up to 4 MFCs, feedback-controlled capacitance manometer, master/slave gas select, gas ratio control
- Stepper motor pallet carrier drive with optical encoder — programmable scan velocity profiling
- Low-pressure hydraulics for safety and smooth operation
- Loadlock linear sensor — computer-controlled positioning for increased accuracy and fail-safe
- Optional 1.25 or 3.0 kW RF solid-state power supply (Advanced Energy)
- Complies with NFPA 79 guidelines; CE option available
Computer & Control System
- Windows 10 real-time GUI with 24" LCD touchscreen on umbilical mobile HI cart
- Context-sensitive recipe manager running from Microsoft SQL database
- Real-time data display and logging — compatible with Excel, Lotus, and Windows applications
- Report generation, remote interface, and printing capability
- Optional SECS/GEM connectivity via OPC server interface
- Distributed Rockwell Control System — DeviceNet and EtherNet/IP fieldbus
- Full maintenance test suite with diagnostic and manual process control
- Service-friendly fully enclosed electronic cabinet
- Remote PC accessibility via Ethernet for software upgrades and file repair
Target Markets
Medical Devices
Optical Communications
Compound Semiconductors
Flat Panel Displays
Chip Resistors & Networks
Telecom Manufacturing
Emerging Materials
Mainstream Silicon
Configure Your 600i System
Our process engineers can help you select the right 600i variant and options for your application. Download the full datasheet or contact us to start the conversation.
