Inline PVD
Sputtering
Systems
A complete family of inline physical vapor deposition sputtering systems — from compact R&D-capable platforms to high-throughput production tools. All engineered for consistent, repeatable thin film coatings your process demands.
Choose the Right Platform for Your Process
Every KDF inline sputtering system is built on decades of MRC and KDF engineering heritage — redesigned and improved to meet today's most demanding thin film applications. All systems are customizable to your substrate, film stack, and throughput requirements.
- 20 × 20 inch pallet area
- 4 target system
- Sub-1% uniformity with ERPP™ planetary pallet
- HIPIMS capable — ultra-dense film architecture
- PEM reactive gas control for dielectric precision
- 12 × 12 inch pallet area
- 3 or 4 target configuration
- Sub-1% uniformity with planetary pallet option
- Full-production down sputter architecture
- 26.5 × 30 inch pallet area
- 4 target system
- Low particulate side sputter architecture
- Maximum throughput for high-volume production
- 19 × 19 inch pallet area
- 4 target system
- Low particulate side sputter advantage
- High quality PVD thin films
- 13 × 13 inch pallet area
- 3 or 4 target configuration
- LMM™ cathode available on ix series
- Ideal for sensitive, low-particulate applications
- Multi-chamber cluster architecture
- Combines sputtering, etch, and CVD processes
- Robotic substrate handling
- Configurable for complex multi-step processes
Five Sputtering Modes. One Platform Family.
All KDF inline sputtering systems support multiple deposition modes — giving process engineers the flexibility to deposit a wide range of metals, alloys, oxides, and nitrides on the same platform.
DC Magnetron
High-rate deposition of conductive metals and alloys. The workhorse mode for semiconductor and industrial production.
RF Sputtering
Enables deposition of insulating and dielectric materials where DC sputtering is not applicable.
Pulsed DC
Reduces arcing during reactive sputtering of oxides and nitrides — improving film quality and process stability.
Reactive
Introduces reactive gases (O₂, N₂) during deposition to form compound films such as TiN, AlN, and SiO₂.
HIPIMS
High-power impulse magnetron sputtering for ultra-dense, high-adhesion films with exceptional surface quality.
Parts, Service & Process Support
KDF doesn't just sell equipment — we back every system with the deepest service and support network in inline sputtering.
OEM Parts & Spares
Original KDF and MRC replacement parts, sputter targets, cathodes, backing plates, and upgrade kits — all from the authorized source.
View Parts →Service & Support
Field service, repair, training, and thin film process development from engineers with 600+ man-years of MRC/KDF equipment experience.
View Services →Pre-Owned Systems
Remanufactured KDF and MRC inline sputtering systems — fully refurbished and supported with the same warranty and service as new equipment.
View Pre-Owned →Not Sure Which System Is Right for You?
Our engineers can help you match the right KDF platform to your substrate, film stack, pallet size, and throughput requirements — and validate your process in our Rockleigh, NJ facility before you commit.
