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KDF Tool Selected By Medtronic for use in Manufacture of Pacemaker Components

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KDF RELEASE 2003

943NTX Sputtering System Meets Medical Device Production Standards

KDF today announced that Medtronic (NYSE: MDT) has selected its 943NTX in-line sputtering system for use in manufacturing pacemaker components. The order verifies that KDF’s technology platforms meet rigorous standards for producing advanced medical devices. The KDF system began installation at Medtronic’s Minneapolis facility in December 2002.

Medtronic selected the 943NTX for its ability to create impervious coatings, a crucial aspect of medical manufacturing since each device is expected to perform flawlessly. The KDF 943NTX features InsetÔ style cathodes, a cathode design that provides long lifetime and high utilization for thick coatings, like those that are used to protect critical pacemaker components. There is no margin for error in pacemaker manufacturing applications and KDF’s superior coating technology meets these standards.

“As an existing customer of KDF, Medtronic is familiar with the strength and capabilities of our 900 Series sputtering systems. The 943NTX provides the process integrity required for producing high stakes medical devices like pacemakers,” said Kurt Flechsig, president of KDF. “KDF already maintains a presence in the medical devices market and this order will serve to increase our market penetration for this industry.”

KDF offers advanced and reliable batch in-line sputtering systems at the industry’s lowest cost of ownership. These systems are used around the world in the semiconductor, telecommunications, aerospace and medical technology markets, each tailored to meet specific processing needs.

For the Medtronic process KDF configured the 900 Series system with an InsetÔ style cathode which supports long-term use in the production of durable and impenetrable coatings. With sputter down capability and easy substrate loading, the 943NTX is ideally suited for medical applications which produce uniform films with an exacting, but repeatable, high-throughput process.

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About KDF
KDF Electronic & Vacuum Services, Inc., produces batch in-line sputtering tools in a wide variety of R&D and production formats for the mainstream silicon, emerging materials and flat-panel display markets. KDF systems are used in the production of semiconductors, photomasks, telecommunications networks, wireless circuits, gallium arsenide (GaAs), high density interconnect, sensors, optoelectronics, flat panel display and radio frequency power devices. KDF is located in Rockleigh, New Jersey, and has representatives in Europe, Japan, Taiwan, Singapore, Malaysia, China and Korea.
About Medtronic
Medtronic, Inc., headquartered in Minneapolis, is the world’s leading medical technology company, providing lifelong solutions for people with chronic disease. www.medtronic.com.
Company Contacts
Kurt Flechsig
President & CEO
Tel: +1 (201) 784-5005
E-mail: kurt@kdf.com

New High Rate DC Reactive Processes for Dielectric Films

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KDF RELEASE 2002

High rate processes for deposition of dielectric films have been developed using DC reactive sputtering on scanning batch tools. A typical high rate process for the deposition of silicon dioxide films from a conductively doped silicon target would allow the formation of nearly one micron of SiO2 in fifteen minutes, as compared with nearly five hours when RF magnetron sputtered from a quartz target. This can represent a very large increase in throughput for the deposition of complex multilayer dielectric waveguides, mirrors or filters.

(Ref: Photonics Spectra, pp. 30-31, November 2002).

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About KDF
KDF Electronic & Vacuum Services, Inc., produces batch in-line sputtering tools in a wide variety of R&D and production formats for the mainstream silicon, emerging materials and flat-panel display markets. KDF systems are used in the production of semiconductors, photomasks, telecommunications networks, wireless circuits, gallium arsenide (GaAs), high density interconnect, sensors, optoelectronics, flat panel display and radio frequency power devices. KDF is located in Rockleigh, New Jersey, and has representatives in Europe, Japan, Taiwan, Singapore, Malaysia, China and Korea.
Company Contacts
Kurt Flechsig
President & CEO
Tel: +1 (201) 784-5005
E-mail: kurt@kdf.com

Highly Uniform Dielectric Films Using A Combined Linear Scanning, Velocity Profiling and Planetary Rotating Motion

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KDF RELEASE 2002

Exceptionally high uniformities and tight repeatabilities have been achieved for dielectric films on KDF 900 series sputtering tools using a proprietary ERPP™ (enhanced rotating planetary pallet) in conjunction with the tool's standard linear scanning mode. We have developed reactive and non-reactive processes for materials such as SiO2, Si3N4, TiO2 and Al2O3, with uniformities better than +/- 1% over the pallet and repeatabilities of better than +/-0.5% from pallet to pallet. This performance enables us to provide production processes for multilayer dielectric mirrors and filters to the optoelectronics and display industry, as well as high quality silicon nitride passivation layers and antireflective coatings for compound semiconductors and solar cells. Specific reactive and non-reactive processes are discussed in depth. Additionally, a new system capability that allows the scan velocity to be programmed flexibly is discussed with respect to its potential for further uniformity improvement.

(Ref: Vacuum Technology and Coating, December 2002).

Related Article:
Highly uniform dielectric films using a combined linear scanning, velocity profiling and planetary rotating motion

By S. Gupta, A. Ruspini and M. Fregeau, KDF Electronics and Vacuum Services
December 2002, Vacuum Technology & Coating article

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About KDF
KDF Electronic & Vacuum Services, Inc., produces batch in-line sputtering tools in a wide variety of R&D and production formats for the mainstream silicon, emerging materials and flat-panel display markets. KDF systems are used in the production of semiconductors, photomasks, telecommunications networks, wireless circuits, gallium arsenide (GaAs), high density interconnect, sensors, optoelectronics, flat panel display and radio frequency power devices. KDF is located in Rockleigh, New Jersey, and has representatives in Europe, Japan, Taiwan, Singapore, Malaysia, China and Korea.
Company Contacts
Kurt Flechsig
President & CEO
Tel: +1 (201) 784-5005
E-mail: kurt@kdf.com

KDF Sputtering System Selected By Plasmion and Leading Korean Manufacturer Hanwha L & C for Advanced Oled Production

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KDF RELEASE 2002

KDF today announced that Plasmion Corporation has ordered a custom engineered KDF 744NT batch sputtering system for installation at Hanwha L&C’s Korean facility. The KDF 744NT was ordered as the result of a strategic alliance between Plasmion and Hanwha L&C wherein, Hanwha licensed Plasmion’s Negative Sputter Ion Beam (NSIB) technology and ordered a production system from Plasmion. After critical review, Plasmion and Hanwha selected KDF’s 744NT tool retrofitted with Plasmion’s Negative Sputter Ion Beam. By developing a tailored solution quickly, KDF demonstrated its ability to meet the needs of partners and customers based on its core competencies. The production system is scheduled for installation at Hanwha L&C in December 2002.

Hanwha will use the enhanced 744NT system to manufacture and process ITO coated glass for use in the production of Organic Light Emitting Displays (OLED). OLED is a new type of flat panel display that is currently used in automotive audio and cellular telephone applications. Hanwha plastics manufactured with the new production system will be able to replace the glass used to manufacture OLEDs, providing the display industry with a more cost-efficient way of manufacturing displays for miniature and mobile applications.

“We selected the KDF 700 Series production platform because this batch sputtering system can be easily upgraded to utilize our ITO coating process,” commented James A. Ionson, CEO, Plasmion Corporation. Mr. Ionson further disclosed that “Our strategic alliance with Hanwha is the first of many production partnerships we plan to form with end-users of our process technology, and we will be actively working with major equipment manufacturers such as KDF to embed our cost-effective process within their systems.”

“This is a reliable and advanced solution that will meet our requirements for ITO coated glass production,” said Jin Ki Paik, vice president, business development, Hanwha. “Uniting Plasmion’s Negative Sputter Ion Beam technology with KDF’s production-proven sputter system provides us with the best of both worlds.”

“This design win demonstrates how flexible and customer-focused we are. In this instance our systems will be customized to meet the customer’s specific needs and cover a wide variety of process requirements. Partnering with a leading-edge technology provider such as Plasmion Corporation gave us the opportunity to participate in this design win for Hanwha, the top petrochemical company in Korea,” said Kurt Flechsig, president of KDF.

The KDF 744NT is a large area, four-target, batch sputtering system, designed for processing high-density interconnect, 200mm semiconductor wafers and flat panel displays. The Plasmion enhancement of the KDF 744NT includes an NSIB that provides excellent ITO coatings on polycarbonate substrates at very low temperatures. Plasmion’s technology creates solid ion beams during the coating process to achieve an atomically smooth surface.

The 744NT is equipped with a high-vacuum loadlock configured with a substrate pre-heat that enables the tool’s high throughput. The 744NT offers a pallet area of 19 x 19 inches with a compact footprint that uses less than one-third the floorspace of competing equipment. The tool can hold four 200mm wafers or multiple smaller wafers and features two processing pallets, allowing an instantaneous change of wafer sizes and the ability to process both the front and back sides of wafers.

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About KDF
KDF Electronic & Vacuum Services, Inc., produces batch in-line sputtering tools in a wide variety of R&D and production formats for the mainstream silicon, emerging materials and flat-panel display markets. KDF systems are used in the production of semiconductors, photomasks, telecommunications networks, wireless circuits, gallium arsenide (GaAs), high density interconnect, sensors, optoelectronics, flat panel display and radio frequency power devices. KDF is located in Rockleigh, New Jersey, and has representatives in Europe, Japan, Taiwan, Singapore, Malaysia, China and Korea.
About Hanwha L & C
Hanwha Group is a multi-billion dollar company involved in information services, construction, explosives, machinery, trade and telecommunications. Established in 1966, Hanwha L&C Corp., a unit of the Chemical and Explosive Division of Hanwha Group, currently is involved in plastics, chemical products, automotive parts and floor-covering materials with manufacturing plants in Jinhae and Bookang, Korea.
About Plasmion
Plasmion Corporation is a market-driven technology company focused on delivering leading edge thin film application technology for the display, semiconductor, storage disk and optical communications industries and novel atmospheric pressure plasma technology for use in manufacturing plasma displays, etching/cleaning of electronic structures, surface modification and medical sterilization. Plasmion was formed in 2001 through the merger of two companies founded by scientists and inventors from Stevens Institute of Technology. Plasmion Corporation is headquartered in Hoboken, NJ, with representatives worldwide, including Europe, Japan, Korea and Taiwan.
Company Contacts
Kurt Flechsig
President & CEO
Tel: +1 (201) 784-5005
E-mail: kurt@kdf.com

Raytheon Orders 943NT In-Line Sputtering System From KDF

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KDF RELEASE 2002

KDF today announced that the Electronic Systems business of Raytheon Company (NYSE: RTN) has ordered a 943NT in-line sputtering tool for use in its El Segundo, California facility. Electronic Systems, which is a world leader in the development and deployment of key defense programs, will use the 943NT in the manufacture of its advanced technology products. This order from Electronic Systems marks the first new tool that Raytheon has purchased from KDF.

Raytheon has been a KDF customer since 1988, and has previously purchased remanufactured equipment from KDF and batch products from MRC, which KDF acquired from Tokyo Electron Limited (TEL) in 1998.

“In order to maintain our position as a global leader in advanced defense programs, it is imperative that our processing equipment provides us with the strongest technology platform possible. We already have an established process with the installed MRC 943 tool, and this new KDF in-line sputtering system will allow us to modernize the equipment without sacrificing process, reliability or cost effectiveness,” said Howard Ito, Principal Engineer of Raytheon’s Electronic Systems business.

Electronic Systems will primarily use the 943NT for thin film hybrid circuitry. This circuitry is subsequently utilized by the company in the development and production of a number of defense programs, including radars and sensors for ground-based, airborne, and space-based systems.

“As Electronic Systems moves to replace its current equipment, our 943NT provided the most seamless and efficient platform for this transition. Electronic Systems is already familiar with our technology, and the 943NT will continue to enable it to produce the most advanced circuits for its defense programs,” said Kurt Flechsig, president of KDF.

The 943NT is part of KDF’s 900 Series of physical vapor deposition (PVD) systems, all of which feature in-line sputter-down capabilities. Popular for their pure metal target deposition and convenient wafer-to-pallet loading abilities, the 900 Series tools can be configured with an optional high vacuum loadlock and three or four target positions. High-rate DC magnetron sputtering and single- or multiple-pass deposition features support the versatility and high-throughput of this production equipment. Cathode and substrate orientation are horizontal, allowing gentle substrate fixturing for users.

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About KDF
KDF Electronic & Vacuum Services, Inc., produces batch in-line sputtering tools in a wide variety of R&D and production formats for the mainstream silicon, emerging materials and flat-panel display markets. KDF systems are used in the production of semiconductors, photomasks, telecommunications networks, wireless circuits, gallium arsenide (GaAs), high density interconnect, sensors, optoelectronics, flat panel display and radio frequency power devices. KDF is located in Rockleigh, New Jersey, and has representatives in Europe, Japan, Taiwan, Singapore, Malaysia, China and Korea.
About Raytheon
Electronic Systems, which is Raytheon Company’s largest business, is a world leader in the development and production of advanced defense electronics, missiles, ground-based and airborne radars, naval and maritime electronics, and space systems. Electronic Systems comprises six business units: Air Combat and Strike Systems and Surveillance & Reconnaissance Systems, both headquartered in El Segundo, Calif.; Tactical Systems, headquartered in Dallas, Texas; Air/Missile Defense Systems, headquartered in Bedford, Mass.; Naval & Maritime Integrated Systems, headquartered in Portsmouth, R.I.; and, Missile Systems, headquartered in Tucson, Ariz.
With headquarters in Lexington, Mass., Raytheon Company (NYSE: RTN) is a global technology leader in defense, government and commercial electronics, and business and special mission aircraft.
Company Contacts
Kurt Flechsig
President & CEO
Tel: +1 (201) 784-5005
E-mail: kurt@kdf.com

We offer the most advanced and reliable physical vapor deposition batch in-line sputtering tools at the industry’s lowest cost of ownership. KDF systems can be customized to meet the customer’s needs and cover a wide variety of process requirements for the mainstream silicon, emerging materials and flat panel display markets.

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