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KDF Sputtering System Selected By Plasmion and Leading Korean Manufacturer Hanwha L & C for Advanced Oled Production

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KDF today announced that Plasmion Corporation has ordered a custom engineered KDF 744NT batch sputtering system for installation at Hanwha L&C’s Korean facility. The KDF 744NT was ordered as the result of a strategic alliance between Plasmion and Hanwha L&C wherein, Hanwha licensed Plasmion’s Negative Sputter Ion Beam (NSIB) technology and ordered a production system from Plasmion. After critical review, Plasmion and Hanwha selected KDF’s 744NT tool retrofitted with Plasmion’s Negative Sputter Ion Beam. By developing a tailored solution quickly, KDF demonstrated its ability to meet the needs of partners and customers based on its core competencies. The production system is scheduled for installation at Hanwha L&C in December 2002.

Hanwha will use the enhanced 744NT system to manufacture and process ITO coated glass for use in the production of Organic Light Emitting Displays (OLED). OLED is a new type of flat panel display that is currently used in automotive audio and cellular telephone applications. Hanwha plastics manufactured with the new production system will be able to replace the glass used to manufacture OLEDs, providing the display industry with a more cost-efficient way of manufacturing displays for miniature and mobile applications.

“We selected the KDF 700 Series production platform because this batch sputtering system can be easily upgraded to utilize our ITO coating process,” commented James A. Ionson, CEO, Plasmion Corporation. Mr. Ionson further disclosed that “Our strategic alliance with Hanwha is the first of many production partnerships we plan to form with end-users of our process technology, and we will be actively working with major equipment manufacturers such as KDF to embed our cost-effective process within their systems.”

“This is a reliable and advanced solution that will meet our requirements for ITO coated glass production,” said Jin Ki Paik, vice president, business development, Hanwha. “Uniting Plasmion’s Negative Sputter Ion Beam technology with KDF’s production-proven sputter system provides us with the best of both worlds.”

“This design win demonstrates how flexible and customer-focused we are. In this instance our systems will be customized to meet the customer’s specific needs and cover a wide variety of process requirements. Partnering with a leading-edge technology provider such as Plasmion Corporation gave us the opportunity to participate in this design win for Hanwha, the top petrochemical company in Korea,” said Kurt Flechsig, president of KDF.

The KDF 744NT is a large area, four-target, batch sputtering system, designed for processing high-density interconnect, 200mm semiconductor wafers and flat panel displays. The Plasmion enhancement of the KDF 744NT includes an NSIB that provides excellent ITO coatings on polycarbonate substrates at very low temperatures. Plasmion’s technology creates solid ion beams during the coating process to achieve an atomically smooth surface.

The 744NT is equipped with a high-vacuum loadlock configured with a substrate pre-heat that enables the tool’s high throughput. The 744NT offers a pallet area of 19 x 19 inches with a compact footprint that uses less than one-third the floorspace of competing equipment. The tool can hold four 200mm wafers or multiple smaller wafers and features two processing pallets, allowing an instantaneous change of wafer sizes and the ability to process both the front and back sides of wafers.

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About KDF
KDF Electronic & Vacuum Services, Inc., produces batch in-line sputtering tools in a wide variety of R&D and production formats for the mainstream silicon, emerging materials and flat-panel display markets. KDF systems are used in the production of semiconductors, photomasks, telecommunications networks, wireless circuits, gallium arsenide (GaAs), high density interconnect, sensors, optoelectronics, flat panel display and radio frequency power devices. KDF is located in Rockleigh, New Jersey, and has representatives in Europe, Japan, Taiwan, Singapore, Malaysia, China and Korea.
About Hanwha L & C
Hanwha Group is a multi-billion dollar company involved in information services, construction, explosives, machinery, trade and telecommunications. Established in 1966, Hanwha L&C Corp., a unit of the Chemical and Explosive Division of Hanwha Group, currently is involved in plastics, chemical products, automotive parts and floor-covering materials with manufacturing plants in Jinhae and Bookang, Korea.
About Plasmion
Plasmion Corporation is a market-driven technology company focused on delivering leading edge thin film application technology for the display, semiconductor, storage disk and optical communications industries and novel atmospheric pressure plasma technology for use in manufacturing plasma displays, etching/cleaning of electronic structures, surface modification and medical sterilization. Plasmion was formed in 2001 through the merger of two companies founded by scientists and inventors from Stevens Institute of Technology. Plasmion Corporation is headquartered in Hoboken, NJ, with representatives worldwide, including Europe, Japan, Korea and Taiwan.

Raytheon Orders 943NT In-Line Sputtering System From KDF

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KDF today announced that the Electronic Systems business of Raytheon Company (NYSE: RTN) has ordered a 943NT in-line sputtering tool for use in its El Segundo, California facility. Electronic Systems, which is a world leader in the development and deployment of key defense programs, will use the 943NT in the manufacture of its advanced technology products. This order from Electronic Systems marks the first new tool that Raytheon has purchased from KDF.

Raytheon has been a KDF customer since 1988, and has previously purchased remanufactured equipment from KDF and batch products from MRC, which KDF acquired from Tokyo Electron Limited (TEL) in 1998.

“In order to maintain our position as a global leader in advanced defense programs, it is imperative that our processing equipment provides us with the strongest technology platform possible. We already have an established process with the installed MRC 943 tool, and this new KDF in-line sputtering system will allow us to modernize the equipment without sacrificing process, reliability or cost effectiveness,” said Howard Ito, Principal Engineer of Raytheon’s Electronic Systems business.

Electronic Systems will primarily use the 943NT for thin film hybrid circuitry. This circuitry is subsequently utilized by the company in the development and production of a number of defense programs, including radars and sensors for ground-based, airborne, and space-based systems.

“As Electronic Systems moves to replace its current equipment, our 943NT provided the most seamless and efficient platform for this transition. Electronic Systems is already familiar with our technology, and the 943NT will continue to enable it to produce the most advanced circuits for its defense programs,” said Kurt Flechsig, president of KDF.

The 943NT is part of KDF’s 900 Series of physical vapor deposition (PVD) systems, all of which feature in-line sputter-down capabilities. Popular for their pure metal target deposition and convenient wafer-to-pallet loading abilities, the 900 Series tools can be configured with an optional high vacuum loadlock and three or four target positions. High-rate DC magnetron sputtering and single- or multiple-pass deposition features support the versatility and high-throughput of this production equipment. Cathode and substrate orientation are horizontal, allowing gentle substrate fixturing for users.

About KDF
KDF Electronic & Vacuum Services, Inc., produces batch in-line sputtering tools in a wide variety of R&D and production formats for the mainstream silicon, emerging materials and flat-panel display markets. KDF systems are used in the production of semiconductors, photomasks, telecommunications networks, wireless circuits, gallium arsenide (GaAs), high density interconnect, sensors, optoelectronics, flat panel display and radio frequency power devices. KDF is located in Rockleigh, New Jersey, and has representatives in Europe, Japan, Taiwan, Singapore, Malaysia, China and Korea.
About Raytheon
Electronic Systems, which is Raytheon Company’s largest business, is a world leader in the development and production of advanced defense electronics, missiles, ground-based and airborne radars, naval and maritime electronics, and space systems. Electronic Systems comprises six business units: Air Combat and Strike Systems and Surveillance & Reconnaissance Systems, both headquartered in El Segundo, Calif.; Tactical Systems, headquartered in Dallas, Texas; Air/Missile Defense Systems, headquartered in Bedford, Mass.; Naval & Maritime Integrated Systems, headquartered in Portsmouth, R.I.; and, Missile Systems, headquartered in Tucson, Ariz.
With headquarters in Lexington, Mass., Raytheon Company (NYSE: RTN) is a global technology leader in defense, government and commercial electronics, and business and special mission aircraft.

KDF Installs Multiple In-Line Sputtering Systems in Taiwan

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KDF RELEASE 2002

KDF today announced that it has successfully completed installation of multiple in-line sputtering systems at two Taiwanese foundries. Micro Electro Magnetical Technologies Corporation (MEMT), based in Chunan, Miaoli, Taiwan, purchased a 603NT tool for critical film applications. Suntek Compound Semiconductor Company, based in Hsinchu Shien, Taiwan, ordered a 943NTX system with a planetary pallet for GaAs wafer production. The orders mark the first business between KDF and both companies.

“These two sales demonstrate the market penetration that KDF continues to gain in Taiwan. This increased interest from Taiwanese companies is based on the performance and cost-effectiveness of our tools,” said Kurt Flechsig, president of KDF. “We are pleased to welcome MEMT and Suntek as our two newest customers. KDF is committed to gaining a strong foothold in Taiwan, and we believe that these installations reflect our growth in this region.”

KDF is well positioned to capitalize on the expanding telecommunications and compound semiconductor market segments in Taiwan because of the breadth of its experience in these markets in the U.S. and Europe. As Taiwan’s gallium arsenide (GaAs) market continues to grow, KDF is focused on penetrating this market in its early stages.

“After evaluating the performance of other equipment, we found that the KDF tool surpassed the competition in terms of uniformity, which is critical in our discrete device production. Further, the cost of ownership advantages and customer support capabilities were key drivers in this purchasing decision,” said Allen Yang, assistant vice president of sales & marketing at MEMT.

According to the Semiconductor Industry Association (SIA), the worldwide discrete market is forecasted to grow in 2003 to $14 billion, a 16 percent increase from 2002. The discrete semiconductor market is predicted to increase another 15 percent in 2004, to total $16 billion.

The 943NTX is part of KDF’s 900 Series of PVD systems, all of which feature in-line sputter-down capabilities. The 943NTX offers the option of extended cathodes and excellent uniformity. Popular for their pure metal target deposition and convenient wafer-to-pallet loading abilities, the 900 Series systems can be configured with an optional high vacuum load-lock and three or four target positions. High-rate DC magnetron sputtering and single- or multiple-pass deposition features support the versatility and high throughput of these production systems. Cathode and substrate orientation are horizontal, allowing gentle substrate fixturing for users.

The 603NT is a vertical, side-sputtering tool that is typically used for sensitive applications requiring target material that produces unusually high particulate contamination. The 600 Series are dual load lock, in-line, vertical batch sputtering systems. They are configured with an optional high vacuum load lock and three or four target positions and have a 13 x 13 inch pallet size.

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About KDF
KDF Electronic & Vacuum Services, Inc., produces batch in-line sputtering tools in a wide variety of R&D and production formats for the mainstream silicon, emerging materials and flat-panel display markets. KDF systems are used in the production of semiconductors, photomasks, telecommunications networks, wireless circuits, gallium arsenide (GaAs), high density interconnect, sensors, optoelectronics, flat panel display and radio frequency power devices. KDF is located in Rockleigh, New Jersey, and has representatives in Europe, Japan, Taiwan, Singapore, Malaysia, China and Korea.
About Micro Electro Magnetical Technologies
Micro Electro Magnetical Technologies (MEMT) is a newly established power discrete wafer foundry in Taiwan, specializing in 6″ Schottky (largest size in the world), TVS, Super Fast and Thyristor wafer manufacturing and marketing. With the most advanced technology, equipment and facility, MEMT is now at the leading position providing comprehensive power discrete solutions to worldwide device designer, power device assembly houses and IDM’s. The up-to-date capacity is around 12000 pcs per month and will be extended to 24000 pcs in the near future.
About SUNTEK
SUNTEK Compound Semiconductor Co. was established in August 2000. The company offers the complete spectrum of compound semiconductor foundry services and solutions for the wireless communication, broadband application, and optoelectronics markets. SUNTEK focuses on the capacity assurance, competitive service cost, rapid turn-around service and total quality management for customers using world-class fab facility as well as advanced process technologies.
Company Contacts
Kurt Flechsig
President & CEO
Tel: +1 (201) 784-5005
E-mail: kurt@kdf.com

Batch Processing Not Ready To Retire

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ORIGINAL ARTICLE DATE: APRIL 22, 2002
By Kurt Flechsig

Electronic News – A decade ago, the development of cluster tools in the IC manufacturing industry seemed to herald the end of batch processing systems. Single-wafer, multichamber tools were the wave of the future-they promised much in terms of throughput, uniformity, process control and unmanned automation. In contrast, the multiwafer, single-chamber batch tool was the thing we were moving away from, so much like VCRs and tape cassettes today.

In high-tech manufacturing, we’re naturally drawn to the cutting edge, to the promise of better processes and higher return on investment. For example, many industries use tools like this parylene coating machine from Para Tech Coating to help streamline processes. That’s what pushed the cluster movement more than 10 years ago, and plasma vapor deposition (PVD) processes were not immune to the trend. Chipmakers needed serious sputtering process improvements to keep up with Moore’s Law, and, to be truthful, the existing batch tools weren’t doing the job.

Batch processing may be a reason as to why companies opt to invest in systems like six sigma certifications, as a way to streamline automation processes, be more cost-effective and time-efficient within an organization.

Since then, batch suppliers have developed a new generation of tools that meet the same processing requirements that drove IC manufacturers to the cluster tool format but with much lower cost. This is how providers such as Octopart manage to get such a wide variety of stock at affordable prices for the industry to make use of. Unfortunately, there still exists a mindset in and outside of the industry that batch equals lagging-edge technology. This misperception can lead manufacturers to invest more in their sputtering processes than is necessary, depending on the application.

For example, a purchasing manager for a telecommunications device customer was at a crossroads. His company’s sputtering technology had moved to cluster PVD, in line with the industry trend, but he now juggled a shrinking budget and a continuing need to produce photonic components. Batch systems could meet his performance specs in terms of film uniformity, throughput, process control and automation as well as SEMI and European CE standards governing tool uptime, reliability, and environmental health and safety, and do so on a platform that was simple to use and maintain.

There were differences in two other critical areas: cost and flexibility. The manufacturer’s cluster tools required an up-front investment of about four times what a comparable batch system would cost; and because batch systems offer simpler design and operation, the cluster tool cost of ownership and tool maintenance costs were also much higher. On the flexibility front, the cluster format limited the company’s ability to move between substrate sizes, and its full automation didn’t allow for manual control of equipment when needed.

Batch systems can run a wide variety of substrate sizes and materials, from fractions of an inch up to 26 inches and larger, square or round, tall or short-and substrate sizes can be changed from run-to-run, if needed. The bottom line: In this case, cluster PVD was overkill. It was like using a backhoe when a shovel would do.

Three trends are shaping the answers to today’s batch-or-cluster PVD question. First, there have been major improvements in sputtering process control through better cathode designs and supporting components, such as residual gas analyzers, power supplies and software. This has resulted in batch tools that offer the process stability, control, uniformity and throughput for many advanced device applications, such as titanium oxide/silicon oxide electric thin-film mirror stacks in the optoelectronics industry.

Second, customer demand for process expertise on the part of the PVD supplier has led to early customer partnerships and the development of customized software and hardware for advanced applications. Batch suppliers, just like other advanced tool suppliers, are now more than ever being asked to prove out customer processes even before the sale of the system.

Third, an increasing variety of new and growing end-markets has led to demand for a flexible, cost-efficient processing platform such as the batch format. A broad customer base illustrates this trend. Potential markets span not just two or three, but 20 to 30 markets, including semiconductors, light-emitting diodes, thin-film resistors and capacitors, medical devices, ring laser gyros, flat panel displays and microelectromechanical systems.

This is not to diminish the value of cluster tools. There’s no doubt that certain applications, such as high aspect ratio via filling in chip manufacturing, will continue to require the complete process isolation offered by cluster tools. But the question between cluster and batch should arise for those many applications that don’t require such a stringent environment.

Author Information: Kurt Flechsig is president of KDF Inc.

About KDF
KDF Electronic & Vacuum Services, Inc., produces batch in-line sputtering tools in a wide variety of R&D and production formats for the mainstream silicon, emerging materials and flat-panel display markets. KDF systems are used in the production of semiconductors, photomasks, telecommunications networks, wireless circuits, gallium arsenide (GaAs), high density interconnect, sensors, optoelectronics, flat panel display and radio frequency power devices. KDF is located in Rockleigh, New Jersey, and has representatives in Europe, Japan, Taiwan, Singapore, Malaysia, China and Korea.
Company Contacts
Kurt Flechsig
President & CEO
Tel: +1 (201) 784-5005
E-mail: kurt@kdf.com

Alcatel Space Installs 943NT In-Line Sputtering System From KDF

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KDF RELEASE 2002

Sale facilitated by European representative TFEsrl

KDF today announced that Alcatel Space, a world leader in space telecommunication, will install its 943NT in-line sputtering system this month. Alcatel Space, which is based in Toulouse, France, will use the KDF system in the manufacture of hybrid circuits for space applications.
“After an evaluation of tools to replace our existing equipment, we found that the KDF 943NT in-line sputtering system was a perfect fit in our hybrid circuit production because it offered superior sputtering technology and the best process reliability,” said Philippe Bondeau, process engineer for Alcatel Space. “The sputter-down capability and easy substrate loading, in tandem with the powerful and flexible software, were key benefits behind our ordering this system, which is being used to produce advanced circuits for space applications.”

TFEsrl, KDF’s European representative, facilitated the sale. Located in Milan, Italy, TFEsrl represents KDF product sales throughout Europe, and employs six senior field representatives with over 10 years of experience each.

“Since this circuitry is being utilized for satellite applications, it is imperative that the system consistently produces uniform films ¾ the technology must be produced exactly and reliably,” said Kurt Flechsig, president of KDF. “As a previous customer of MRC, Alcatel is familiar with the production-proven sputtering technology in the 943NT system. This, coupled with our extensive customer support base, was a key driving point in the sale.”

The 943NT is part of KDF’s 900 Series of PVD systems, all of which feature in-line sputter-down capabilities. Popular for their pure metal target deposition and convenient wafer-to-pallet loading abilities, the 900 Series systems can be configured with an optional high vacuum loadlock and three or four target positions. High-rate DC magnetron sputtering and single- or multiple-pass deposition features support the versatility and high-throughput of these production systems. Cathode and substrate orientation are horizontal, allowing gentle substrate fixturing for users.

# # #
About KDF
KDF Electronic & Vacuum Services, Inc., produces batch in-line sputtering tools in a wide variety of R&D and production formats for the mainstream silicon, emerging materials and flat-panel display markets. KDF systems are used in the production of semiconductors, photomasks, telecommunications networks, wireless circuits, gallium arsenide (GaAs), high density interconnect, sensors, optoelectronics, flat panel display and radio frequency power devices. KDF is located in Rockleigh, New Jersey, and has representatives in Europe, Japan, Taiwan, Singapore, Malaysia, China and Korea.
About Alcatel Space
Alcatel Space ranks among the world's leading space systems prime contractors. Leveraging its dual expertise in civil and military applications, Alcatel Space develops satellite technology solutions for telecommunications, navigation, optical and radar observation, meteorology, and scientific applications. Alcatel Space established its world leadership in satellite orders in 2000, winning the most orders for geo-stationary communications satellites, with a total of 10 satellites (27% of the market). A fully-owned subsidiary of Alcatel (100%), Alcatel Space generated 2000 revenues of 1.4 billion Euros and has 6,000 employees.
About Alcatel
Alcatel (Paris: CGEP.PA and NYSE: ALA) builds next generation networks, delivering integrated end-to-end voice and data networking solutions to established and new carriers, as well as enterprises and consumers worldwide. With sales of EURO 31 billion in 2000 and 110,000 employees and, Alcatel operates in more than 130 countries. www.alcatel.com
Company Contacts
Kurt Flechsig
President & CEO
Tel: +1 (201) 784-5005
E-mail: kurt@kdf.com

We offer the most advanced and reliable physical vapor deposition batch in-line sputtering tools at the industry’s lowest cost of ownership. KDF systems can be customized to meet the customer’s needs and cover a wide variety of process requirements for the mainstream silicon, emerging materials and flat panel display markets.

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