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Advancements in Reactive Sputtering with KDF’s Sputter Sources and PEM
KDF continues to innovate in the field of reactive sputtering with its specially designed and patented sputter sources and the integration of Plasma Emission Monitoring (PEM). Sputter Sources: KDF’s sputter […]
Enhancing Reactive Sputtering with KDF’s Unique Features
KDF, with its extensive experience in designing reactive sputtering batch coating production systems, offers several optional features that set it apart from others. These features include: Optimally Designed Gas Rings: […]
KDF Technologies hosts Boston Scientific
KDF Technologies recently hosted the team from Boston Scientific for acceptance of their new KDF Technologies, LLC 954i sputter system. The 954i will join Boston Scientifics existing fleet of KDF sputter tools to apply critical […]
Explanation of Various Sputtering Modes
Written by Ammar Derraa 04/30/2021 Thin film sputtering, including metal, dielectric, and reactive sputtering can be achieved in one of the following modes: DC sputtering, RF sputtering, Pulsed DC sputtering, […]
What is PVD and Sputtering?
Written by Ammar Derraa 04/30/2021 Introduction to Thin Film Sputtering Thin film technology is the process of depositing and characterizing functional material layers on a substrate. These layers are the […]
DC Sputtering Cathode Design
Written by Kurt Flechsig 7/23/2021 DC Magnetron sputtering is a means to achieve higher rates of sputtering over that of diode operation. KDF offers various cathode designs ranging from […]
KDF Capabilities ‘The Past is Prologue’
KDF was founded in 1986 however it was really born in 1957 with the beginning of Materials Research Corporation, which became a world leader in vacuum processing technology. As often […]
