Sputter Products
SPUTTER PRODUCTS
KDF is committed to delivering quality products
We offer the most advanced and reliable physical vapor deposition batch in-line sputtering tools at the industry’s lowest cost of ownership. KDF systems can be customized to meet the customer’s needs and cover a wide variety of process requirements for the mainstream silicon, emerging materials and flat panel display markets. The complete line of KDF equipment has been redesigned and improved to meet today’s critical applications.
900i/ix Series
12 x 12 inch pallet area
3 or 4 target systems
Gen 2.5 capable
20 x 20 inch pallet area
4 target system
RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering
Sub 1% uniformity with
Planetary pallet option


974 Series
3 or 4 target systems
Gen 2.5 capable
20 x 20 inch pallet area
4 target system
RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering
Sub 1% uniformity with
Planetary pallet option
744i Series
19 x 19 inch pallet area
4 target system
Production system
RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering
– Low Particulate System
– High Quality PVD Thin Films

844i Series
26.5 x 30 inch pallet area
4 target system
High production system
RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering
– Low Particulate System
– High Quality PVD Thin Films


600i/ix Series
13 x 13 inch pallet area
3 or 4 target systems
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering
– Low Particulate System
– High Quality PVD Thin Films
Opus Robotic C2C Loading System
This cassette to cassette option allows full automated wafer loading into our 600, 700 and 800 tools
