Sputter Products
SPUTTER PRODUCTS
KDF is committed to delivering quality products
We offer the most advanced and reliable physical vapor deposition batch in-line sputtering tools at the industry’s lowest cost of ownership. KDF systems can be customized to meet the customer’s needs and cover a wide variety of process requirements for the mainstream silicon, emerging materials and flat panel display markets. The complete line of KDF equipment has been redesigned and improved to meet today’s critical applications.
Please select one of our Sputter Products below:
900i/ix Series
903i, 943i, 943ix, 954i, 954ix
12 x 12 inch pallet area
3 or 4 target systems
12 x 12 inch pallet area
3 or 4 target systems
974i
Gen 2.5 capable
20 x 20 inch pallet area
4 target system
Gen 2.5 capable
20 x 20 inch pallet area
4 target system
DC Magnetron sputtering
RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering
RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering
Down Sputter
Sub 1% uniformity with
Planetary pallet option
Sub 1% uniformity with
Planetary pallet option
974 Series
12 x 12 inch pallet area
3 or 4 target systems
3 or 4 target systems
974i
Gen 2.5 capable
20 x 20 inch pallet area
4 target system
Gen 2.5 capable
20 x 20 inch pallet area
4 target system
DC Magnetron sputtering
RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering
RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering
Down Sputter
Sub 1% uniformity with
Planetary pallet option
Sub 1% uniformity with
Planetary pallet option
744i Series
Gen 2 capable
19 x 19 inch pallet area
4 target system
Production system
19 x 19 inch pallet area
4 target system
Production system
DC Magnetron sputtering
RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering
RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering
Side Sputter Advantage
– Low Particulate System
– High Quality PVD Thin Films
– Low Particulate System
– High Quality PVD Thin Films
844i Series
Gen 3.5 capable
26.5 x 30 inch pallet area
4 target system
High production system
26.5 x 30 inch pallet area
4 target system
High production system
DC Magnetron sputtering
RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering
RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering
Side Sputter Advantage
– Low Particulate System
– High Quality PVD Thin Films
– Low Particulate System
– High Quality PVD Thin Films
600i/ix Series
603i, 643i, 643ix, 654i, 654ix
13 x 13 inch pallet area
3 or 4 target systems
13 x 13 inch pallet area
3 or 4 target systems
RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering
Side Sputter Advantage
– Low Particulate System
– High Quality PVD Thin Films
– Low Particulate System
– High Quality PVD Thin Films
Opus Robotic C2C Loading System
This cassette to cassette option allows full automated wafer loading into our 600, 700 and 800 tools
