KDF RELEASE 2004 KDF today announced that TFR Technologies, Inc. has placed an order for a KDF 954NTX in-line sputtering system with an enhanced rotating planetary pallet (ERPP) option. This is the first order of a KDF system ever placed
Sipat Orders Another KDF 900 Series In-Line Sputtering Tool for High Throughput Surface Acoustic Wave Manufacturing
KDF RELEASE 2004 KDF today announced that the company has received an order for a KDF 954NT in-line sputtering system from the Sichuan Institute of Piezoelectric & Acousto-optic Technology (SIPAT), a leading research and development facility in China. The system
KDF Names Ammar Derra Director of Technology
KDF RELEASE 2004 KDF today named Ammar Derraa, an award-winning scientist and author of more than 50 U.S. patents and disclosures, to the position of director of technology. Dr. Derraa succeeds Su Gupta, who left KDF late last year to
Honeywell Places Follow-On Order for 943NT Sputtering System with KDF
KDF RELEASE 2003 Aerospace business will use tool for commercial satellite applications and guidance systems KDF today announced that Honeywell International (NYSE: HON) has placed a follow-on order for a 943NT in-line sputtering system. This follow-on order provides production-proven validation
KDF Tool Selected By Medtronic for use in Manufacture of Pacemaker Components
KDF RELEASE 2003 943NTX Sputtering System Meets Medical Device Production Standards KDF today announced that Medtronic (NYSE: MDT) has selected its 943NTX in-line sputtering system for use in manufacturing pacemaker components. The order verifies that KDF’s technology platforms meet rigorous
New High Rate DC Reactive Processes for Dielectric Films
KDF RELEASE 2002 High rate processes for deposition of dielectric films have been developed using DC reactive sputtering on scanning batch tools. A typical high rate process for the deposition of silicon dioxide films from a conductively doped silicon target
Highly Uniform Dielectric Films Using A Combined Linear Scanning, Velocity Profiling and Planetary Rotating Motion
KDF RELEASE 2002 Exceptionally high uniformities and tight repeatabilities have been achieved for dielectric films on KDF 900 series sputtering tools using a proprietary ERPP™ (enhanced rotating planetary pallet) in conjunction with the tool’s standard linear scanning mode. We have
KDF Sputtering System Selected By Plasmion and Leading Korean Manufacturer Hanwha L & C for Advanced Oled Production
KDF RELEASE 2002 KDF today announced that Plasmion Corporation has ordered a custom engineered KDF 744NT batch sputtering system for installation at Hanwha L&C’s Korean facility. The KDF 744NT was ordered as the result of a strategic alliance between Plasmion