How KDF's reactive DC sputtering platform enables precise tuning of TiO₂ optical, mechanical, and electrical properties — refractive index from 2.1 to 2.8, roughness from 250 Å to 50 Å, all at constant thickness.

A breakthrough in sputtering system design delivering metallic film uniformity better than ±1% and repeatability exceeding ±0.5% — combining advanced planetary motion with linear scanning.

How KDF Technologies acquired and preserved MRC's legendary 903/943 sputtering platforms — and continues advancing them for today's semiconductor and photonics industries.