KDF RELEASE 2002
Sale facilitated by European representative TFEsrl
KDF today announced that Alcatel Space, a world leader in space telecommunication, will install its 943NT in-line sputtering system this month. Alcatel Space, which is based in Toulouse, France, will use the KDF system in the manufacture of hybrid circuits for space applications.
“After an evaluation of tools to replace our existing equipment, we found that the KDF 943NT in-line sputtering system was a perfect fit in our hybrid circuit production because it offered superior sputtering technology and the best process reliability,” said Philippe Bondeau, process engineer for Alcatel Space. “The sputter-down capability and easy substrate loading, in tandem with the powerful and flexible software, were key benefits behind our ordering this system, which is being used to produce advanced circuits for space applications.”
TFEsrl, KDF’s European representative, facilitated the sale. Located in Milan, Italy, TFEsrl represents KDF product sales throughout Europe, and employs six senior field representatives with over 10 years of experience each.
“Since this circuitry is being utilized for satellite applications, it is imperative that the system consistently produces uniform films ¾ the technology must be produced exactly and reliably,” said Kurt Flechsig, president of KDF. “As a previous customer of MRC, Alcatel is familiar with the production-proven sputtering technology in the 943NT system. This, coupled with our extensive customer support base, was a key driving point in the sale.”
The 943NT is part of KDF’s 900 Series of PVD systems, all of which feature in-line sputter-down capabilities. Popular for their pure metal target deposition and convenient wafer-to-pallet loading abilities, the 900 Series systems can be configured with an optional high vacuum loadlock and three or four target positions. High-rate DC magnetron sputtering and single- or multiple-pass deposition features support the versatility and high-throughput of these production systems. Cathode and substrate orientation are horizontal, allowing gentle substrate fixturing for users.
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