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KDF Announces the Release of its New Improved Pallet Assist Tool, PAT

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KDF RELEASE 2019

KDF is pleased to announce the release of its new Pallet Assist Tool, PAT. Because of the ever-increasing substrate and pallet sizes in today's market, KDF recognized the need for a device that would allow the operators safe and efficient handling of these larger pallets. This device will aid workers with heavy lifting and unloading of pallets from an oversized pallet delivery service. After much field and vendor investigating for similar products on the market (critical placement and clean room compatible), KDF tasked upon its engineering staff to design and manufacture a pallet handling tool to aid in the loading and unloading of pallets into the Load lock chamber of its 744i and 844i systems. The KDF designed manipulator can safely handle 100 lb payload pallets for both loading and unloading in a precise and controlled fashion.

The tool is also integrated and interlocked for operator and system safety. Although originally designed for large glass substrates the tool can also stream line smaller substrates and wafer pallet loading as well. The pallets can be loaded in a vertical or horizontal position and can be rotated a full 180 degrees. Combined with the use of a shrinkfast 998 heat gun, this makes shrink wrapping the substrates onto the pallets an easy process.

The positioning can also accommodate transfer to a customers transport cart by varying the horizontal placement height. The PAT device allows for simple smooth handling utilizing controlled stepped detents riding on linear rail bearings along with twin pneumatically assisted gas cylinders that virtually eliminate any type of operator lifting of heavy payloads. The PAT helps to speed up and insure safe placements of sensitive substrates onto the pallet, thereby increasing Fab productivity and minimizing any substrate damage or breakage due to excessive handling.

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KDF Announces the Release of the G-12 Full-Face Erosion Cathode

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KDF RELEASE 2009

After two years of development and testing KDF is pleased to announce the release of the G-12 full-face erosion cathode, The G 12 will be exclusively featured in our Ci Cluster tool system line up.

This new design round cathode utilizes a proprietary hi-strength close coupled magnet assembly which allows the cathode to be perfectly suited for today’s more demanding applications such as compound semiconductor apps and unique Oxide depositions. The variable speed controlled motor driven magnet pack will run at speeds that allow materials to be put down at varying rates, yet able to maintain excellent uniformity over an eight inch substrate. This Patent Pending design further strengthens KDF’s position in critical film technologies. Preliminary testing has indicated that basic metal uniformity of > 2% is easily achieved. This cathode coupled with KDF’s Ci cluster tool, with counter rotating anode stage will enable uniformities of less then 1% wafer to wafer. With over 23 years of engineering and manufacturing expertise KDF is ready to offer another World Class Product.

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About KDF
KDF Electronic & Vacuum Services, Inc., produces batch in-line sputtering tools in a wide variety of R&D and production formats for the mainstream silicon, emerging materials and flat-panel display markets. KDF systems are used in the production of semiconductors, photomasks, telecommunications networks, wireless circuits, gallium arsenide (GaAs), high density interconnect, sensors, optoelectronics, flat panel display and radio frequency power devices. KDF is located in Rockleigh, New Jersey, and has representatives in Europe, Japan, Taiwan, Singapore, Malaysia, China and Korea.
Company Contacts
Kurt Flechsig
President & CEO
Tel: +1 (201) 784-5005
E-mail: kurt@kdf.com

KDF Releases its Newest Version of the Field Proven LMM Cathodes

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KDF RELEASE 2008

LMM™ Patented Device Full Face Erosion Cathode

The LMM or Linear Moving Magnetron was a leap forward in the production environment for Compound Semiconductor market place, allowing greater run times and improved films for reactive process’s.
KDF has just released its newest version of the field proven LMM cathodes , this latest generation cathode now offers a lateral motion magnet pac that increases the the overall utilization to approx 60%. This recently engineered improvement allows for longer run times between target changes and aids in the decrease to target poisoning during long fully reactive runs. This new revision cathode will be Patent Pending as well , securing KDF position as a leader in cathode design technologies. By creating this new Pivotal end turn around method , burn through at corners has been significantly reduced and there by extending the usable target life for Full Face Erosion cathode.

Currently this cathode is only available for KDF tool sets thereby enabling KDF end users to benefit from this extraordinary cathode. Customers that are interested in this cathode should contact KDF to discuss their technical needs, KDF can also run customer demo’s in a Process Lab Tools.

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About KDF
KDF Electronic & Vacuum Services, Inc., produces batch in-line sputtering tools in a wide variety of R&D and production formats for the mainstream silicon, emerging materials and flat-panel display markets. KDF systems are used in the production of semiconductors, photomasks, telecommunications networks, wireless circuits, gallium arsenide (GaAs), high density interconnect, sensors, optoelectronics, flat panel display and radio frequency power devices. KDF is located in Rockleigh, New Jersey, and has representatives in Europe, Japan, Taiwan, Singapore, Malaysia, China and Korea.
Company Contacts
Kurt Flechsig
President & CEO
Tel: +1 (201) 784-5005
E-mail: kurt@kdf.com

KDF Releases and Installs the New 844i Systems

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KDF RELEASE 2008

After ten months of engineering KDF has released and installed the new 844i systems. KDF had listen to their customers and realized that the 844 platform had to grow in order to accommodate the new generations of hi-end displays and CCD pickups , hence the larger format 844 was born. The new 844i offers a pallet size of 26.5 by 30 inchs , which also increase throughput for other users which utilize wafers or alumna substrates.

The new system only grew a few inches externally , but KDF was able to give back by repackaging the overall computers and PLC controls, the new Cybertronics all in one computer and keyboard assembly allowed us to utilize a small portable round around computer station and touch screen to run all system functions. All motions in the tool are executed by either stepper driven encoder feedback drives or in the case of the Load Lock elevator a linear encoder for positional readouts. Motion control and speed controls are extremely critical for exacting process , so speed regulation pallet scanning is resoluted at .001%. RF and DC power supplies communicate directly through RS232 type ports to provide all data and information from that power supply, which are done in real time. The use of MKS cluster gauges simplify the wiring and allow greater interlocking of sensitive gauge types . KDF’s extensive in-house expertise of software allows us to integrate all our gained experience of process and machine tool operation into a seamless operating system for the customer.

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About KDF
KDF Electronic & Vacuum Services, Inc., produces batch in-line sputtering tools in a wide variety of R&D and production formats for the mainstream silicon, emerging materials and flat-panel display markets. KDF systems are used in the production of semiconductors, photomasks, telecommunications networks, wireless circuits, gallium arsenide (GaAs), high density interconnect, sensors, optoelectronics, flat panel display and radio frequency power devices. KDF is located in Rockleigh, New Jersey, and has representatives in Europe, Japan, Taiwan, Singapore, Malaysia, China and Korea.
Company Contacts
Kurt Flechsig
President & CEO
Tel: +1 (201) 784-5005
E-mail: kurt@kdf.com

KDF Announces the new i series System Controls Platform

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KDF RELEASE 2007

After years of testing and evaluation, KDF has introduced the new i series controller, replacing the Brooks Automation Controller with new technology. This control system has been designed to be retofitable, allowing an easy upgrade path for previous KDF models (“T “, “GT”, and “NT”). Although some older systems may require additional hardware upgrades to maintain compatibility with current and future system enhancements, doing so will bring these field proven systems to an even higher level of performance and reliability.

This i series platform is based on a distributed Rockwell Automation Control System utilizing Devicenet and Ethernet I/P fieldbus technologies. These interfaces dramatically reduce the need for point to point wiring allowing for greatly increased reliability, easier troubleshooting, and a higher level of system integration reducing system part count (and spare part inventory). Easy system upgrade is accomplished with the use of flash memory.

Windows XP Pro™ industrialized computer using the latest Intel Pentium Processor™ technology, Large Hard disk drive (80 mb or better) for local recipe and data log storage, and an advanced graphics controller.

Real-time GUI Environment, coupled with a SAW Touch screen and 19″ LCD monitor.Surface Acoustic Wave touch screen technology guarantees virtually 100% optical transmission, and is not affected by the use of gloves.

Context sensitive, multi-step (up to 200 steps / recipe) recipe manager is compatible with Microsoft Access™ database. Recipe storage is limited only by hard drive space (additional recipes can be stored on network drive). Any lost data that you may experience concerning your hard drive can be restored through places like DriveSavers, to ensure that you can make the most out of this new technology.

Fully integrated package for real-time data display, data logging is fully compatible with Excel™, Lotus™ and other windows applications, report generation, remote interface and printing. Secure remote diagnostics and software support available over the Internet (high speed connection required) with local firewall and anti-virus protection.

OPC server interface allows SECS/GEM communication package (optional) and other applications to connect to a common database of machine I/O and system level data such as Datalogs, recipes, RGA data, etc.

Maintenance test suite with full diagnostic and manual process control capability, along with a host of other macro sub routine programs.

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About KDF
KDF Electronic & Vacuum Services, Inc., produces batch in-line sputtering tools in a wide variety of R&D and production formats for the mainstream silicon, emerging materials and flat-panel display markets. KDF systems are used in the production of semiconductors, photomasks, telecommunications networks, wireless circuits, gallium arsenide (GaAs), high density interconnect, sensors, optoelectronics, flat panel display and radio frequency power devices. KDF is located in Rockleigh, New Jersey, and has representatives in Europe, Japan, Taiwan, Singapore, Malaysia, China and Korea.
Company Contacts
Kurt Flechsig
President & CEO
Tel: +1 (201) 784-5005
E-mail: kurt@kdf.com

We offer the most advanced and reliable physical vapor deposition batch in-line sputtering tools at the industry’s lowest cost of ownership. KDF systems can be customized to meet the customer’s needs and cover a wide variety of process requirements for the mainstream silicon, emerging materials and flat panel display markets.

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