Sputter Products

KDF is committed to delivering quality products

We offer the most advanced and reliable physical vapor deposition batch in-line sputtering tools at the industry’s lowest cost of ownership. KDF systems can be customized to meet the customer’s needs and cover a wide variety of process requirements for the mainstream silicon, emerging materials and flat panel display markets. The complete line of KDF equipment has been redesigned and improved to meet today’s critical applications.

Please select one of our Sputter Products below:

KDF In-line Products 654

 

600i/ix Series

603i, 643i, 643ix, 654i, 654ix
13 x 13 inch pallet area
3 or 4 target systems

RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering

Side Sputter Advantage
– Low Particulate System
– High Quality PVD Thin Films
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KDF In-line Products 744

 

744i Series

Gen 2 capable
19 x 19 inch pallet area
4 target system
Production system

DC Magnetron sputtering
RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering

Side Sputter Advantage
– Low Particulate System
– High Quality PVD Thin Films
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KDF In-line Products 844

 

844i Series

Gen 3.5 capable
26.5 x 30 inch pallet area
4 target system
High production system

DC Magnetron sputtering
RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering

Side Sputter Advantage
– Low Particulate System
– High Quality PVD Thin Films
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KDF In-line Products 900 Series

 

900i/ix Series

903i, 943i, 943ix, 954i, 954ix
12 x 12 inch pallet area
3 or 4 target systems

974i
Gen 2.5 capable
20 x 20 inch pallet area
4 target system

DC Magnetron sputtering
RF sputtering
Pulsed DC sputtering
Reactive sputtering
HIPIMS sputtering

Down Sputter
Sub 1% uniformity with
Planetary pallet option
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KDF Electronics Opus C to C

 

Opus Robotic C2C Loading System

This cassette to cassette option allows full automated wafer loading into our 600, 700 and 800 tools
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KDF Electronics Cluster Ci Tool

 

Cluster Ci Tool

Four and Eight Sided Systems
100-200mm wafers
Wafer carrier for odd sizes
Hi Rate moving magnetrons (G12)
Degas RF Etch, RIE, MIE
Along with ion mill
PVD uniformity below 2%
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KDF Sputter Products Cluster CiM

 

Cluster CiM Tools

Standalone CiMs
[Cluster individual Modules]
Single sputter module
Multi sputter module
Etch module
Degas module
Single wafer manual load
Automated cassette loading
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