The 600i Series features dual load lock, in-line, RF / DC side sputtering batch systems.
They are configured with an optional high vacuum load lock and three or four target positions and have a 13 x 13-inch pallet size. (unique pallet designs available).
The 600 Series systems are particularly popular for sensitive applications requiring target material that produces unusually high particulate contamination.
The 600 Series includes the 603i, 643i, 654i, and 654ix. The ix series systems offer an extended sputter area to increase process uniformities utilizing KDF’s “X-series”™ cathodes. The ix series also supports KDF’s new LMM™ cathode along with other cathodes designed by our in house cathode design team.
Both the 654i and the 654ix offer four-target versatility. All 600 series systems can also be enhanced with scan velocity profiling. The 600 series systems all meet the Semiconductor S2-0706 safety spec as part of the standard system package, a CE option for the European community is available. Pulsed DC sputtering via Advanced Energy Pinnacle Plus is also available.
All 600 series system have remote PC accessibility allowing for software upgrades & file repair via an Internet Ethernet connection. Full Documentation is standard and is available on std. paper, clean room paper or an electronic CD version. For those applications that require an extra level of cleanliness or handling the Robotic option is available.