Sputtering Cathodes

KDF Cathode Technology

KDF has an active ongoing cathode development program encompassing theoretical simulation, mechanical design, empirical measurements and process testing on actual tools.

All existing cathodes have been theoretically modeled using a sophisticated simulation package, as well as magnetically mapped and process-tested. New cathode designs will be available shortly which improve uniformity and target utilization.

LMM – Linear Moving Magnet Cathode:

The linear moving magnet sputter cathode, LMM a recently patented full face erosion rectangular design is available for all KDF systems. The advanced design of the LMM allows for both RF + DC operation. The LMM offers high material utilization with minimized re-deposition resulting in reduced particulates. The LMM enhanced design advances the capability to work in DC pulse reactive sputter mode with all materials. A Magterial version of the LMM is available providing the ultimate in utilization and lifetime when sputtering magnetic materials such as Nickel.

Mark II:

Formerly a MRC cathode, KDF has since tuned and perfected this magnetron cathode which is ideally used for dielectric materials such as SiO2, or for reactive depositions of materials such as indium-tin oxide.

Mark III:

KDF’s second-generation cathode has an improved magnet design for better uniformity and longer lifetime compared to the Mark II.

X Series:

Now KDF’s most popular systems 600 and 900 series systems can have this new series of KDF cathodes, which have been lengthened from 15 inches to 17 inches, offering, improved uniformity over the entire pallet. The X Series cathodes are available in Planar, Inset™ and Magterial™ cathode form.

Inset Cathode:

Since KDF’s purchase of MRC’s batch business in 1998 KDF has made many improvements to the original Inset design for high uniformity and high utilization of material. KDF has also created new Inset Cathodes that have increased sizes for the standard batch tools. The KDF 744 and 844 tools have Inset Cathodes up to 30.5 inches in length. The clamped material design can accommodate most metal and all precious metal types.

Focest Cathode:

This was originally developed for Al deep trench fill. It offers great uniformity, rate and material utilization as well. This cathode has special applications in the 600/900 system family.

Magterial Cathode:

This planar-type cathode allows magnetron sputtering of ferrous metals such as nickel and iron at high rates and high uniformities. The cathode field strength is high enough to allow use of quarter- inch thick bonded magnetic targets, thus providing a relatively long target life for these materials.

KDF is the only Inline system manufacturer that designs their own cathodes for our complete product line, from the standard 5 by 15 to our enhanced 5 by 17 cathodes all the way to our 844 cathodes which are 5 b7 30 inch.

KDF does not depend on third party copy cat designs we produce some of the best cathodes in the world and we have the results to prove it.

Process dependability comes from strong designs. The cathode is the critical part of your sputtering tool and therefore choosing the right one is also critical .

KDF has a host of cathodes that are application dependant so that every specific requirement of an application can be met.

Have questions? Contact KDF about Sputtering Cathodes.