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Sputtering
Targets |
Process
Materials |
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KDF offers a large selection of high purity metals, alloys, non-metallic and cermets for virtually every sputtering and evaporation application in the industry. KDF’s facility is configured to manufacture production quantities of these materials, but it is also capable of small quantities for research applications at competitive prices. This manufacturing flexibility demonstrates KDF’s commitment to actively anticipating and meeting the needs of its customers. High purity sputtering targets are available in a variety of geometries, including planar, |
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circular, conical, rectangular, ring, delta and custom configurations. KDF incorporates material processing techniques that include: |
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Vacuum induction melting |
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Vacuum/ inert hot pressing |
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Hot/cold isostatic pressing |
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Electron beam melting |
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Computer controlled machining |
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KDF supplies Chi, Mu, Muset (one piece) and Upsilon Inset TM Cathode TM target materials in a wide variety of materials. In addition KDF supplies conversion kits that enable you to convert your existing Inset CathodeTM configuration from one style to another. |
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All KDF manufactured targets are shipped with: |
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Certificate of Conformance
Material Purity Certificate
MSDS (Material Safety Data Sheet) when Required. |
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Each target is chemically cleaned, marked and carefully packaged under vacuum or inert gas as required by the individual target. To preserve the purity of these target, handle only with rubber gloves. |
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