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KDF
News |
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New High Rate DC
Reactive Processes For
Dielectric Films |
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2002 |
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High rate processes for deposition of dielectric films have been developed using DC reactive sputtering on scanning batch tools. A typical high rate process for the deposition of silicon dioxide films from a conductively doped silicon target would allow the formation of nearly one micron of SiO2 in fifteen minutes, as compared with nearly five hours when RF magnetron sputtered from a quartz target. This can represent a very large increase in throughput for the deposition of complex multilayer dielectric waveguides, mirrors or filters. |
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(Ref: Photonics Spectra, pp. 30-31, November 2002). |
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Related
Article:
Forming dielectric films using high-rate DC reactive processes |
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| ABOUT
KDF |
| KDF Electronic & Vacuum Services, Inc., produces batch in-line sputtering tools in a wide variety of R&D and production formats for the mainstream silicon, emerging materials and flat-panel display markets. KDF systems are used in the production of semiconductors, photomasks, telecommunications networks, wireless circuits, gallium arsenide (GaAs), high density interconnect, sensors, optoelectronics, flat panel display and radio frequency power devices. KDF is located in Rockleigh, New Jersey, and has representatives in Europe, Japan, Taiwan, Singapore, Malaysia, China and Korea. |
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COMPANY CONTACTS:
Kurt Flechsig
President
Tel: +1 (201) 784-5005
e-mail: kurt@loomisgroup.com
Todd Plaisted
Director of Sales and Marketing
Tel: +1 (201) 784-5005
e-mail: todd@kdf.com
AGENCY CONTACTS:
Marlene Berrios
Loomis Group
Tel: +1 (617) 638-0022
e-mail: berriosm@loomisgroup.com
Charla Jones
Loomis Group
Tel: +1 (617) 638- 0022
e-mail: charla@loomisgroup.com |
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